Mask linearity and the mask error enhancement factor

Microlithography World

Volumn 8, Issue 1, 1999, Pages 11-12

  Mack, Chris A ^a  

^a KLA Tencor Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

CRITICAL DIMENSION (CD); MASK ERROR ENHANCEMENT FACTOR (MEEF); OPTICAL PROXIMITY CORRECTION TECHNIQUE;

MASKS;

EID: 0033475644     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (1)