Iodine-and bromine-based dry etching of LaCaMnO3

Plasma Chemistry and Plasma Processing

Volumn 19, Issue 2, 1999, Pages 229-239

  Wang, J J ^a   Cho, H ^a   Childress, J R ^a   Pearton, S J ^a   Sharifi, F ^b   Dahmen, K H ^c   Gillman, E S ^c  

^a University of Florida   (United States)

^b Florida State University ^*  (United States)

^c FLORIDA STATE UNIVERSITY   (United States)

Author keywords

Iodine and bromine based dry etching; Plasma etching

Indexed keywords

EID: 0033475639     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1021643709200     Document Type: Article

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