The influence of monovalent cations on the stability of electrochemically formed nickel fluoride films

Journal of Solid State Electrochemistry

Volumn 3, Issue 5, 1999, Pages 239-244

  Noel, M ^a   Santhanam, R ^a   Chidambaram, S ^a  

^a CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE   (India)

Author keywords

Monovalent fluorides; Nickel dissolution; Nif2 layer

Indexed keywords

EID: 0033472328     PISSN: 14328488     EISSN: None     Source Type: Journal    
DOI: 10.1007/s100080050153     Document Type: Article

References (21)

1. Hackerman N, Snavely ES, Fiel LD (1967) Corros Sci 7: 39
2. Hackerman N, Snavely ES, Fiel LD (1967) Electrochim Acta 12: 535
3. Hauffe K (1989) Fluorine, Hydrogen fluoride and Hydrofluoric acid. In: Behrens D (ed) Dechema corrosion handbook, vol 5. VCH, Weinheim, p 103
4. Burden J, Tatlow JC (1960) The electrochemical process for the synthesis of fluoro-organic compounds. In: Stacy M, Tatlow JC, Sharpe AC (eds) Advances in fluorine chemistry, vol 1. Butterworth, London, p 129
5. Nagase S (1967) Electrochemical fluorination. In: Tarrent P (ed) Fluorine chemistry reviews, vol 1. Marcel Dekker, New York, p 77
6. Hauffe K (1987) Fluorides. In: Behrens D (ed) Dechema corrosion handbook, vol 1. VCH, Weinheim, p 107
7. Tasaka A, Kobayashi H, Negami M, Hori M, Osada T, Nagasaki K, Ozaki T, Nakayama H, Katamura K (1997) J Electrochem Soc 144: 192
8. Tasaka A, Kawagoe T, Takuwa A, Yamanaka M, Tojo T, Aritsuka M (1998) J Electrochem Soc 145: 1160
9. Tasaka A, Osada T, Kawagoe T, Kobayashi M, Takamuku A, Ozasa K, Yachi T, Ichitani T, Morikawa K (1998) J Fluorine Chem 87: 163
10. Dumont H, Qian SY, Conway BE (1997) J Appl Electrochem 27: 267
11. de Vries G, Grantham LF (1967) Electrochem Technol 5: 335
12. Osterwald J, Trunk H (1977) Werkst Korros 28: 321
13. Cid M, Jouanneav A, Ngauga D, Petit MC (1978) Electrochim Acta 23: 945.
14. Strehblow HH, Titze B, Lochel B (1979) Corros Sci 19: 1047
15. Lochel B, Strehblow HH, Sakashita M (1984) J Electrochem Soc 131: 522
16. Lochel B, Strehblow HH, Sakashita M (1984) J Electrochem Soc 131:713
17. Macdougall B, Graham MJ (1985) J Electrochem Soc 132:2553
18. Noel M, Chidambaram S (1994) J Electroanal Chem 369: 25
19. Noel M, Chidambaram S (1994) J Fluorine Chem 68: 121
20. Dampier FW, Coll TA (1986) J Electrochem Soc 133: 938
21. Hagan WP, Hampson WA, Packer RK (1986) Electrochim Acta 31: 699