Effective escape depth of photoelectrons for hydrocarbon films in total electron yield measurement at the C K-edge

Journal of Synchrotron Radiation

Volumn 6, Issue 3, 1999, Pages 803-804

  Ohara, Hideaki ^a   Yamamoto, Yasushi ^a   Kajikawa, Kotaro ^a   Ishii, Hisao ^a   Seki, Kazuhiko ^a   Ouchi, Yukio ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

AFM; Effective escape depth; Hydrocarbon films; Total electron yield; XANES

Indexed keywords

EID: 0033467582     PISSN: 09090495     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0909049599004033     Document Type: Article

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