Low-energy Ar+ ion induced angularly resolved Al(100) and Al(110) sputtering measurements

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 6, 1999, Pages 3443-3448

  Smith, P C ^a,b   Ruzic, D N ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033458418     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582080     Document Type: Article

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