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Volumn 891, Issue , 1999, Pages 325-332

Interaction of weakly ionized highly dissociated hydrogen plasma with solid surfaces

Author keywords

[No Author keywords available]

Indexed keywords

ALLOY; HYDROGEN; METAL; NICKEL;

EID: 0033451198     PISSN: 00778923     EISSN: None     Source Type: Book Series    
DOI: 10.1111/j.1749-6632.1999.tb08780.x     Document Type: Article
Times cited : (4)

References (15)
  • 5
    • 0029478207 scopus 로고
    • Ultraclean semiconductor processing technology and surface chemical cleaning and pasivation
    • M. Liehr, M. Heyns and M. Hirose, Ed., Pittsburg
    • 5. Montgomery, J. S., J. P. Barnak, C. Silvestre, J. R. Hauser & J. R. Nemanich. 1995. In Ultraclean semiconductor processing technology and surface chemical cleaning and pasivation. M. Liehr, M. Heyns and M. Hirose, Ed. 279-286. Mater. Sci. Soc., Pittsburg.
    • (1995) Mater. Sci. Soc. , pp. 279-286
    • Montgomery, J.S.1    Barnak, J.P.2    Silvestre, C.3    Hauser, J.R.4    Nemanich, J.R.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.