Depth dependence of hydrogenation using electron cyclotron plasma in GaAs-on-Si solar cell structures

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 2, 1999, Pages 453-457

  Kakinuma, H ^a,b   Ueda, T ^a   Gotoh, S ^a   Akiyama, M ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

^b Advanced Power Device Laboratory   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033448942     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581605     Document Type: Article

References (19)

1. For a review, S. F. Fang, K. Adomi, S. Iyer, H. Morkoc, H. Zabel, C. Choi, and N. Otsuka, J. Appl. Phys. 68, R31 (1990), and references therein.
2. M. Yamaguchi, J. Mater. Sci. 6, 376 (1991).
3. M. Akiyama, Y. Kawarada, and K. Kaminishi, J. Cryst. Growth 68, 21 (1984).
4. M. Yamaguchi, M. Sugo, and Y. Itoh, Appl. Phys. Lett. 54, 2568 (1989).
5. T. Soga, H. Nishikawa, T. Jimbo, and M. Umeno, J. Cryst. Growth 107, 479 (1991).
6. T. I. Kamins and P. J. Marcoux, IEEE Electron Device Lett. EDL-1, 159 (1980).
7. J. M. Zavada, S. J. Pearton, R. G. Wilson, C. S. Wu, M. Stalova, F. Ren, J. Lopata, and W. C. Deutremont-Smith, and S. W. Novak, J. Appl. Phys. 65, 347 (1988).
8. S. J. Pearton, C. S. Wu, M. Stalova, F. Ren, J. Lopata, W. C. Deutremont-Smith, S. M. Vernon, and V. E. Haven, Appl. Phys. Lett. 51, 496 (1987).
9. H. Kakinuma, M. Mohri, and T. Tsuruoka, Jpn. J. Appl. Phys., Part 1 33, 654 (1994).
10. F. P. McCluskey, L. Pfeiffer, K. W. West, J. Lopata, M. Lamont Schonoes, T. D. Harris, S. J. Pearton, and W. C. Deutremont-Smith, Appl. Phys. Lett. 54, 1769 (1989).
11. SIMS measurements were performed at the Foundation for Promotion of Material Science and Technology of Japan, Tokyo.
12. A. Freundrich, H. Kamada, G. Neu, and B. Gil, Phys. Rev. B 40, 1652 (1989).
13. A. Freundlich, A. Leycuras, J. C. Grenet, and C. Grattepain, Appl. Phys. Lett. 53, 2635 (1988).
14. Y. Chen, A. Freundlich, H. Kamada, and G. Nen, Appl. Phys. Lett. 54, 45 (1989).
15. A. Jalil, A. Heurtel, Y. Marfaing, and J. Chevallier, J. Appl. Phys. 66, 5854 (1989).
16. H. Cho, E. Kim, S. Min, and C. Lee, Phys. Rev. B 43, 14498 (1991).
17. F. H. Pollak and M. Cardona, Phys. Rev. 172, 816 (1968).
18. S. J. Pearton, W. C. Dautremont-Smith, J. Lopata, C. W. Tu, and C. R. Abernathy, Phys. Rev. B 36, 4260 (1987).
19. T. Achtnich, G. Burri, and M. Ilegems, J. Vac. Sci. Technol. A 7, 2532 (1989).