Interfacial reactions of metal thin films on implanted channels under high current density

Journal of the Korean Physical Society

Volumn 35, Issue SUPPL. 2, 1999, Pages

  Lin, H H ^a   Chen, K N ^a   Cheng, S L ^a   Peng, Y C ^a   Shen, G H ^a   Chen, L J ^a   Chen, C R ^b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b UNITED MICROELECTRONICS CORPORATION   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033439854     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

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