A new approach for in-laboratory XAFS equipment

Journal of Synchrotron Radiation

Volumn 6, Issue 3, 1999, Pages 170-171

  Taguchi, Takeyoshi ^a   Xiao, Qi Fan ^b   Harada, Jimpei ^a  

^a RIGAKU CORPORATION   (Japan)

^b X ray Optical Systems   (United States)

Author keywords

In laboratory XAFS; Polycapillary

Indexed keywords

EID: 0033423773     PISSN: 09090495     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0909049599000084     Document Type: Article

References (6)

1. Georgopoulos, P. & Knapp, G. S.(1981). Appl. Cryst., 14, 3
2. Nomura M. (1981). PhD thesis, University of Tokyo, Japan.
3. Sakurai, K & Osaka, N.(1997). Proceedings of the 9th International Conference on X-Ray Absorption Fine Structure, C2-327
4. Stern, E. A. Ed.(1980). Laboratory EXAFS Facilities-1980, AIP Conference Proceedings No.64
5. Tohji, K., Mizushima, T. & Udagawa, Y. (1990). Jpn. J. Appl. Phys. 29, 2171
6. Udagawa, Y. edt. (1993), Japan Scientific Press, "X-ray Absorption Fine Structure", 114