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Volumn 12, Issue 1, 1999, Pages 49-65
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Measurements of oxide films in Al-(6-17) wt%Si foundry alloys using the Qualiflash filtration technique
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Author keywords
Al Si alloys; Melt cleanliness; Oxides; Qualiflash filtration technique
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Indexed keywords
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EID: 0033423578
PISSN: 13640461
EISSN: None
Source Type: Journal
DOI: 10.1080/13640461.1999.11819343 Document Type: Article |
Times cited : (5)
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References (21)
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