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Volumn 12, Issue 1, 1999, Pages 49-65

Measurements of oxide films in Al-(6-17) wt%Si foundry alloys using the Qualiflash filtration technique

Author keywords

Al Si alloys; Melt cleanliness; Oxides; Qualiflash filtration technique

Indexed keywords


EID: 0033423578     PISSN: 13640461     EISSN: None     Source Type: Journal    
DOI: 10.1080/13640461.1999.11819343     Document Type: Article
Times cited : (5)

References (21)
  • 11
    • 85034539747 scopus 로고
    • Ph.D. Thesis, McGill University, Montreal, Canada
    • C. Tian, Ph.D. Thesis, McGill University, Montreal, Canada, 1994.
    • (1994)
    • Tian, C.1
  • 12
    • 0346920244 scopus 로고
    • Proc. Int. Sympos., eds. M. Gilbert, P. Tremblay and E. Ozberk, The Metallurgical Society of CIM, Montreal, Canada
    • C. Tian and R. I. L. Guthrie, Recent Developments in Light Metals, Proc. Int. Sympos., eds. M. Gilbert, P. Tremblay and E. Ozberk, The Metallurgical Society of CIM, Montreal, Canada, 1994, 415.
    • (1994) Recent Developments in Light Metals , pp. 415
    • Tian, C.1    Guthrie, R.I.L.2
  • 18


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.