Calibration specimens for determining energy-dispersive X-ray k-factors of boron, nitrogen, oxygen, and fluorine

Microscopy and Microanalysis

Volumn 5, Issue 1, 1999, Pages 29-38

  Malac, M ^a   Egerton, R F ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

Author keywords

Energy dispersive X ray spectroscopy; Energy loss spectroscopy; k factors; Light element microanalysis

Indexed keywords

ANGUILLIFORMES;

EID: 0033416244     PISSN: 14319276     EISSN: None     Source Type: Journal    
DOI: 10.1017/S1431927699000021     Document Type: Article

References (20)

1. 2,3 absorption fine structure in thin silicon. In: Microscopy Semiconducter Materials Conference (Oxford, 25-28March 1991) IOP Conference Series No. 117. Bristol: Institute of Physics, pp 55-62
2. Ciliax BJ, Kirk KL, Leapman RD (1993) Radiation damage of fluorinated organic compounds measured by parallel electron energy loss spectroscopy. Ultramicroscopy 48:13-25
3. Cliff G and Lorimer GW (1975) The quantitative analysis of thin specimens. J Micros 103:203-207
4. Egerton RF (1993) Oscillator-strength parameterization of innershell cross sections. Ultramicroscopy 50:13-28
5. Egerton RF (1996) Electron Energy-Loss Spectroscopy in the Electron Microscope, 2nd ed. New York: Plenum Press
6. Egerton RF, Cheng SC (1994) Characterisation of an analytical electron microscope with a NiO test specimen. Ultramicroscopy 55:43-54
7. Egerton RF, Wong K (1995) The performance of analytical electron microscopes and EDX systems, measured with a nickel oxide test specimen. In: JMSA Proceedings: Microscopy and Microanalysis 1995, Bailey GW, Ellisman MH, Hennigar RA, Zaluzec NJ (eds.). New York: Jones & Begell, pp 600-601
8. Goldstein JI, Costley JL, Lorimer GW, Reed SJB (1977) Quantitative X-ray analysis in the electron microscope. In: Scanning Electron Microscopy/1977, Vol. I, Johari O (ed). Chicago: IIT Research Institute, pp 315-324
9. Hall CR (1966) On the production of characteristic X-rays in thin metal crystals. Proc R Soc Lond A 295:140-163
10. Henke BL, Lee P, Tanaka TJ, Shimabukuro RL, Fujikawa BK (1982) Low-energy x-ray interaction coefficients: photoabsorption, scattering and reflection. At Data Nucl Data Tables 27:1-50 (see also http://cindy.lbl.gov/optical_constants/atten2.htlm)
11. Hobbs LW (1979) Radiation damage in electron microscopy of inorganic solids. Ultramicroscopy 3:381-386
12. Horita Z, Sano T, Nemoto M (1987) Simplification of X-ray absorption correction in thin-sample quantitative analysis. Ultramicroscopy 21:271-276
13. Maher DM, Joy DC, Ellington MB, Zaluzec NJ, Mochel PE (1981) Relative accuracy of k-factor calculations for thin film X-ray analysis. In: Analytical Electron Microscopy 1981, Geiss RH (ed). San Francisco: San Francisco Press, pp 33-38
14. Malis T, Cheng SC, Egerton RF (1988) EELS log-ratio technique for specimen-thickness measurement in the TEM. J Electron Microsc Tech 8:193-200
15. Rez P (1982) Cross sections for energy loss spectrometry. Ultramicroscopy 9:283-288
16. Skiff WM, Carpenter RW, Lin SH (1987) Near edge fine structure analysis of core shell excitonic absorption edges in silicon and its refractory compounds with the use of electron energy microspectroscopy. J Appl Phys 62:2439-2449
17. Steel EB, Newbery DE, Pella P (1981) Preparation of thin-film glass standards for analytical electron microscopy. In: Analytical Electron Microscopy 1981, Geiss RH (ed). San Francisco: San Francisco Press, pp 65-70
18. Williams DB (1993) Light element microanalysis and imaging. In: Quantitative Microbeam Analysis, Fitzgerald AG, Storey BE, Fabian D. (eds). Bristol: Institute of Physics, pp 169-177
19. Williams DB, Carter CB (1996) Transmission Electron Microscopy: A Textbook for Materials Science. New York: Plenum Press
20. Zemyan SM, Williams DB (1993) Variables in calculated k-factors for analytical electron microscopy. Microbeam Anal 2:S182-S183