Buried CoSi2 layers in silicon on insulator formed by wafer bonding

Chinese Physics Letters

Volumn 16, Issue 4, 1999, Pages 282-284

  Zhu, Shi Yang ^a   Huang, Yi Ping ^a   Ru, Guo Ping ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT COMPOUNDS; CRYSTALLINE MATERIALS; SILICA; SILICON ON INSULATOR TECHNOLOGY; SILICON OXIDES; WAFER BONDING;

BOND PROCESS; BONDED WAFERS; CRYSTALLINE SI; POLYCRYSTALLINE; SILICON ON INSULATOR; SILICON WAFER BONDING; SINGLE-CRYSTALLINE; SOLID PHASE REACTION; WAFER BONDING TECHNIQUES;

SILICON WAFERS;

EID: 0033414346     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/16/4/019     Document Type: Article

References (7)

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