Evaluation of the mechanical properties of thin metal films

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 128-132

  Ma, Dejun ^a   Xu, Kewei ^a   He, Jiawen ^a   Lu, Jian ^b  

^a XI'AN JIAOTONG UNIVERSITY   (China)

^b UNIVERSITÉ DE TECHNOLOGIE DE TROYES   (France)

Author keywords

Hardening index; Metal films; Nano indentation; X ray diffraction; Yield strength

Indexed keywords

ALUMINUM; COPPER; HARDENING; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; STEEL; STRAIN MEASUREMENT; STRESS ANALYSIS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS; YIELD STRESS;

HARDENING INDEX; NANOINDENTATION;

METALLIC FILMS;

ALUMINUM; FILM; HARDNESS; SILICON; STRENGTH ASSESSMENT;

EID: 0033373177     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00218-2     Document Type: Conference Paper

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