Microstructuring of materials by pulsed laser focusing and projection technique

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3618, Issue , 1999, Pages 340-347

  Exner, Horst ^a   Keiper, Bernd ^a   Meja, Peter ^a  

^a UNIVERSITY OF APPLIED SCIENCES MITTWEIDA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; FOCUSING; LASER ABLATION; MASKS; MATHEMATICAL MODELS; PULSED LASER APPLICATIONS; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GLASS; SEMICONDUCTING SILICON; TEMPERATURE;

HALF EMPIRICAL ROTATION SYMMETRICAL MODEL; LASER MICROPROCESSING; MASK PROJECTION TECHNIQUE; PULSED LASER FOCUSING;

MICROELECTRONIC PROCESSING;

EID: 0033366044     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)