Elektrochemische herstellung amorpher chromschichten

Galvanotechnik

Volumn 90, Issue 9, 1999, Pages 2425-2434

  Plieth, W ^a   Voos, B ^a   Schroder N ^a   McCaskie, J ^a   Martyak, N M ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CORROSION RESISTANCE; CURRENT DENSITY; ELECTRODEPOSITION; ELECTROPLATING SOLUTIONS; HARDNESS; MORPHOLOGY; NICKEL ALLOYS; PROTECTIVE COATINGS;

AMORPHOUS CHROMIUM COATINGS;

CHROMIUM;

EID: 0033365633     PISSN: 00164232     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (11)

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4. B. Voos, W. Plieth; J. McCaskie, N.M. Martyak, unveröffentlicht
5. JCPDS-Kartei Nr. 6-0694
6. JCPDS-Kartei Nr. 19-323
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8. H. Gräfe: Photoelektrochemische Untersuchungen an Eisenund Chrom-Passivschichten, (Diplomarbeit) FU Berlin 1990
9. R. Y. Tsai, S. T. Wu: J. Electrochem. Soc. 136, 1341 (1989)
10. A. Watson, A. M. H. Anderson, M. R. el-Sharif, C. U. Chisholm: Trans. Inst. Met. Fin. 70,26(1992)
11. H. Stünzi, L Spiccia, F. P. Rotzinger, W. Marty: Inorg. Chem. 28, 66 (1989)