Substrate induced DLC film thickness variations

Thin Solid Films

Volumn 355, Issue , 1999, Pages 353-356

  Xu, Weilu ^a   Huang, L J ^a   Shih, Y Z ^a   Kim, T ^a   Hung, Y ^a   Li, George ^b  

^a SEAGATE TECHNOLOGY   (United States)

^b Inc 3150 de la Cruz Blvd ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; COBALT ALLOYS; FILM GROWTH; MAGNETIC MATERIALS; NUCLEATION; SECONDARY ION MASS SPECTROMETRY; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION;

PHYSICAL VAPOR DEPOSITION (PVD);

AMORPHOUS FILMS;

EID: 0033364839     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00455-1     Document Type: Article

References (8)

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3. Cooper C.V., et al. Surf. and Coat. Technol. 63:(3):1994;129.
4. Clay K.J., et al. Diamond Related Mater. 7:(8):1998;1100.
5. Liu Z.H., et al. Diamond Related Mater. 7:(7):1998;1059.
6. Huang L.J., et al. J. Vac. Technol. A. 15:(4):1997;2196.
7. Huang L.J., et al. Physical Review B. 50:(24):1994;18453.
8. Wang J.S., et al. Thin Solid Films. 325:1998;163.