Roughness and critical exponents analysis of diamond films by AFM imaging

Thin Solid Films

Volumn 354, Issue 1, 1999, Pages 1-4

  Salvadori, M C ^a   Silveira, M G ^a   Cattani, M ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SUBSTRATES; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL);

CRITICAL EXPONENT ANALYSIS;

DIAMOND FILMS;

EID: 0033363470     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00522-2     Document Type: Article

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