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Volumn 3618, Issue , 1999, Pages 475-486
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Advances in pulsed laser deposition growth of nitride thin films
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC BEAMS;
CRYSTAL STRUCTURE;
FILM GROWTH;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
MOLECULAR BEAM EPITAXY;
NITRIDES;
SEMICONDUCTING FILMS;
SEMICONDUCTING GALLIUM COMPOUNDS;
SEMICONDUCTOR DOPING;
STOICHIOMETRY;
SUBSTRATES;
TEMPERATURE;
ATOMIC NITROGEN;
LUMINESCENCE SPECTROSCOPY;
PULSED LASER DEPOSITION;
REACTIVE NITROGEN;
PULSED LASER APPLICATIONS;
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EID: 0033362709
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (1)
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References (20)
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