|
Volumn 12, Issue 2, 1999, Pages 214-228
|
Control charts for random and fixed components of variation in the case of fixed wafer locations and measurement positions
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CHEMICAL VAPOR DEPOSITION;
NUMERICAL ANALYSIS;
QUALITY CONTROL;
RANDOM ERRORS;
SEMICONDUCTOR DEVICE MODELS;
STATISTICAL PROCESS CONTROL;
THICKNESS MEASUREMENT;
CONTROL CHARTS;
FIXED WAFER LOCATION;
PROCESS MONITORING;
WAFER GRINDING;
SILICON WAFERS;
|
EID: 0033362063
PISSN: 08946507
EISSN: None
Source Type: Journal
DOI: 10.1109/66.762880 Document Type: Article |
Times cited : (11)
|
References (9)
|