High suppression of the short-channel effect in ultrathin SOI n-MOSFETs

Annual Device Research Conference Digest

Volumn , Issue , 1999, Pages 32-33

  Suzuki, Eiichi ^a   Ishii, Kenichi ^a   Kanemaru, Seigo ^a   Maeda, Tatsuro ^a   Sekigawa, Toshihiro ^a   Nagai, Kiyoko ^a   Tsutsumi, Toshiyuki ^a   Hiroshima, Hiroshi ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; THRESHOLD VOLTAGE;

CONDUCTIVE BACKSIDE SUPPORTING (CBSS); EPITAXIAL LAYER TRANSFER (ELTRAN); SHORT CHANNEL EFFECTS (SCE);

MOSFET DEVICES;

EID: 0033361787     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (6)