Optical constants of sputtered U and a-Si at 30.4 and 58.4 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3767, Issue , 1999, Pages 288-294

  Squires, Matthew B ^a   Allred, David D ^a   Turley, R Steven ^a  

^a BRIGHAM YOUNG UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CRYSTALLINE MATERIALS; INTERDIFFUSION (SOLIDS); LIGHT REFLECTION; MONOCHROMATORS; OPTICAL MULTILAYERS; OXIDES; REFLECTIVE COATINGS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION; URANIUM;

MULTILAYER MIRRORS;

MIRRORS;

EID: 0033361723     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)