Novel precleaning treatment for selective tungsten chemical vapor deposition

Thin Solid Films

Volumn 355, Issue , 1999, Pages 451-455

  Chang, T C ^a,b   Mor, Y S ^c   Liu, P T ^c   Sze, S M ^a,c   Yang, Y L ^a   Tsai, M S ^a   Chang, C Y ^c  

^a NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^b NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^c NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CHEMICAL VAPOR DEPOSITION; COPPER COMPOUNDS; NUCLEATION; PASSIVATION; SURFACE CLEANING; TUNGSTEN;

HYDROXYLAMINE SULFATES; PRECLEANING TREATMENTS; SELECTIVE TUNGSTEN CHEMICAL VAPOR DEPOSITION;

THIN FILMS;

EID: 0033358104     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00549-0     Document Type: Article

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