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Surface Science

Volumn 433, Issue , 1999, Pages 239-243

Surface top-layer analysis by positron annihilation induced Auger electron spectroscopy

(3) Ohdaira, Toshiyuki a Suzuki, Ryoichi a Mikado, Tomohisa a

a ELECTROTECHNICAL LABORATORY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; AUGER ELECTRON SPECTROSCOPY; OXIDATION; OXYGEN; SEMICONDUCTING SILICON; SURFACE STRUCTURE;

POSITRON ANNIHILATION; SURFACE TOP LAYER ANALYSIS;

SURFACE TREATMENT;

EID: 0033356564 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(99)00477-X Document Type: Article

Times cited : (8)

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