A far-infrared RAIRS investigation of SnCl4 and water on thin-film carbon and silica surfaces

Surface Science

Volumn 433-435, Issue , 1999, Pages 22-26

  Pilling, M J ^a   Gardner, P ^a   Kausar, R ^b   Pemble, M E ^b   Surman, M ^c  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b UNIVERSITY OF SALFORD   (United Kingdom)

^c DARESBURY LABORATORY   (United Kingdom)

Author keywords

Carbon; Chemisorption; Glass surfaces; Reflection spectroscopy; Silicon oxide; SnCl4; Water

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; CHEMISORPTION; COMPUTATIONAL GEOMETRY; GLASS; INFRARED SPECTROSCOPY; SILICA; SURFACE CHEMISTRY; SYNCHROTRON RADIATION; TIN COMPOUNDS; TUNGSTEN; WATER;

REFLECTION ABSORPTION INFRARED SPECTROSCOPY; TIN CHLORIDES; TIN OXIDE FILMS;

DIELECTRIC FILMS;

EID: 0033356540     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00079-5     Document Type: Article

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