Sub-0.18 μm line/space lithography using 248nm scanners and assisting feature OPC masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue pt 1, 1999, Pages 307-315

  Lin, H T ^a   Lin, John C H ^a   Chiu, C S ^a   Wang, Y Y ^a   Yen, Anthony ^a  

^a Micron Memory Taiwan Co   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; DEFECTS; EXCIMER LASERS; INTEGRATED CIRCUIT MANUFACTURE; MASKS; OPTICAL DEVICES; SCANNING ELECTRON MICROSCOPY;

ASSISTING FEATURE; CRITICAL DIMENSIONS; DEPTH OF FOCUS; MASK DEFECT; MASK ERROR FACTOR; OPTICAL PROXIMITY CORRECTION; SCANNERS;

PHOTOLITHOGRAPHY;

EID: 0033356238     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373326     Document Type: Conference Paper

References (4)