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Journal of Materials Science: Materials in Electronics

Volumn 10, Issue 7, 1999, Pages 533-538

Effect of microstructure on degradation of AlN films prepared by ion beam assisted deposition

(4) Sakuragi, Yoshifumi a Watanabe, Yoshihisa a Amamoto, Yoshiki a Nakamura, Yoshikazu a

a NATIONAL DEFENSE ACADEMY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; DEGRADATION; DEPOSITION; GRANULAR MATERIALS; HYDROCHLORIC ACID; ION BEAMS; MORPHOLOGY; NITRIC ACID; NITROGEN; OPACITY; SEMICONDUCTING ALUMINUM COMPOUNDS; SODIUM COMPOUNDS;

ALUMINUM NITRIDE; ION BEAM ASSISTED DEPOSITION (IBAD);

SEMICONDUCTING FILMS;

EID: 0033356088 PISSN: 09574522 EISSN: None Source Type: Journal
DOI: 10.1023/A:1008944506033 Document Type: Article

Times cited : (6)

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