Characterization of a high throughput implanter for the low temperature polysilicon AMLCD industry

Proceedings of the International Conference on Ion Implantation Technology

Volumn 1, Issue , 1999, Pages 251-254

  Shao, Y ^a   Blake, J ^a   Chen, K ^a   Brailove, A ^a   King, M ^a   Sato, M ^a  

^a EATON CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; COOLING; ION BEAMS; PHOSPHORUS; SEMICONDUCTOR DOPING;

ION IMPLANTERS;

ION IMPLANTATION;

EID: 0033354823     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)