'Novel high-speed approach for CD uniformity mapping and monitoring'

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue pt 1, 1999, Pages 203-208

  Hemar, Shirley ^a   Sade, Ami ^a   Fandrich, Juergen ^a  

^a Applied Materials Inc Israel   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; EXCIMER LASERS; INSPECTION; INTEGRATED CIRCUIT MANUFACTURE; LITHOGRAPHY; PRINTING PROPERTIES; QUALITY CONTROL; SCANNING ELECTRON MICROSCOPY; SPECIFICATIONS;

CRITICAL DIMENSION; DEEP ULTRAVIOLET LITHOGRAPHY; MASKMAKING; PRINTABILITY;

MASKS;

EID: 0033354684     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373315     Document Type: Conference Paper

References (0)