Suppression of topography dependent charging using a phase-controlled pulsed inductively coupled plasma

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1999, Pages 155-158

  Shin, Kyoung Sub ^a   Park, Wan Jae ^a   Kim, Ji Soo ^a   Kang, Chang Jin ^a   Ahn, Tae Hyuk ^a   Moon, Joo Tae ^a   Lee, Moon Yong ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; DEPOSITION; ELECTRIC WIRE; OXIDES; PLASMA SOURCES; PLASMAS; SILICON WAFERS; TUNGSTEN COMPOUNDS;

BIAS POWER; CONTACT HOLE; IN SITU CHARGE UP MONITORING WAFER; PHASE CONTROLLED PULSED INDUCTIVELY COUPLED PLASMA; TOPOGRAPHY DEPENDENT CHARGING;

GATES (TRANSISTOR);

EID: 0033354444     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (12)