Exposure schedule for multiplexing holograms in photopolymer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3801, Issue , 1999, Pages 100-106

  Lin, Shiuan Huei ^a   Hsu, Ken Y ^a   Chen, Wei Zheng ^a   Whang, Wha Tzong ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION; DIFFRACTION GRATINGS; HOLOGRAMS; INITIATORS (CHEMICAL); MONOMERS; NITROGEN; OPTICAL MATERIALS; OPTICAL RECORDING; TEMPERATURE;

HOLOGRAPHIC DATA STORAGE; MULTIPLEXING HOLOGRAMS; PHENANTHRENEQUINONE; PHOTOPOLYMER;

POLYMETHYL METHACRYLATES;

EID: 0033354293     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (20)