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Volumn 46, Issue 3 PART 1, 1999, Pages 218-220

A new technique for the fabrication of thin silicon radiation detectors

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; FABRICATION; SCHOTTKY BARRIER DIODES; SILICON ON INSULATOR TECHNOLOGY; SILICON SENSORS; SILICON WAFERS; SUBSTRATES; SURFACE ROUGHNESS;

EID: 0033354246     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/23.775517     Document Type: Article
Times cited : (15)

References (9)
  • 1
    • 0017538409 scopus 로고
    • Silicon detector ΔE-E particle identification : A theoretically based analysis algorithm and remarks on the fundamental limits to the resolution of particle type by ΔE-E measurements
    • A. G. Seamster, R. E. L. Green and R.G. Korteling, "Silicon detector ΔE-E particle identification : A theoretically based analysis algorithm and remarks on the fundamental limits to the resolution of particle type by ΔE-E measurements, Nucl. Instr. and Meth., Vol. 145, pp. 583-591, 1977.
    • (1977) Nucl. Instr. and Meth. , vol.145 , pp. 583-591
    • Seamster, A.G.1    Green, R.E.L.2    Korteling, R.G.3
  • 2
    • 0025401270 scopus 로고
    • Thin epitaxial silicon detectors
    • L. Stab, "Thin epitaxial silicon detectors", Nucl. Instr. and Meth., Vol. A288, pp. 24-30, 1990.
    • (1990) Nucl. Instr. and Meth. , vol.A288 , pp. 24-30
    • Stab, L.1
  • 3
    • 0000054227 scopus 로고    scopus 로고
    • Thin detectors for the CHICSi ΔE-E Telescope
    • L. Evensen et al., "Thin detectors for the CHICSi ΔE-E Telescope, IEEE Trans. Nucl. Sci., Vol. 44, pp. 629-634, 1997.
    • (1997) IEEE Trans. Nucl. Sci. , vol.44 , pp. 629-634
    • Evensen, L.1
  • 5
    • 0024620628 scopus 로고
    • On the use of thin ion implanted Si detectors in heavy ion experiments
    • L. Lavergne-Gosselin et al., "On the use of thin ion implanted Si detectors in heavy ion experiments", Nucl. Instr. and Meth., Vol. A276, pp. 210-215, 1989.
    • (1989) Nucl. Instr. and Meth. , vol.A276 , pp. 210-215
    • Lavergne-Gosselin, L.1
  • 6
    • 0027557488 scopus 로고
    • Application of wet chemical selective etching to the fabrication of thin silicon detectors
    • B. Schmidt, J. von Borany and D. Schubert, "Application of wet chemical selective etching to the fabrication of thin silicon detectors", Nucl. Instr. and Meth., Vol. A326, pp. 21-26, 1993.
    • (1993) Nucl. Instr. and Meth. , vol.A326 , pp. 21-26
    • Schmidt, B.1    Von Borany, J.2    Schubert, D.3
  • 7
    • 0026898739 scopus 로고
    • Anisotropic etching of silicon in TMAH solutions
    • O. Tabata et al., Anisotropic etching of silicon in TMAH solutions", Sensors and Actuators A, Vol. 34, pp. 51-57, 1992.
    • (1992) Sensors and Actuators A , vol.34 , pp. 51-57
    • Tabata, O.1
  • 8
    • 0342726728 scopus 로고
    • Second Int. Symp. Semiconductor Wafer Bonding : Science, Technology and Applications
    • H. Baumgart, Ch. Hunt, M. Schmidt and T. Abe (eds), Electrochem. Soc., Pennington
    • Second Int. Symp. Semiconductor Wafer Bonding : Science, Technology and Applications", H. Baumgart, Ch. Hunt, M. Schmidt and T. Abe (eds), Electrochem. Soc. Proc. Vol. 93-29, Electrochem. Soc., Pennington, 1993.
    • (1993) Electrochem. Soc. Proc. , vol.93 , Issue.29
  • 9
    • 84866817883 scopus 로고    scopus 로고
    • "Thin film Schottky diode detector device for detection of ionising radiation", Patent WO9723003
    • "Thin film Schottky diode detector device for detection of ionising radiation", L. Babadjian, F. Foulon, S. Spirkovitch, Patent WO9723003.
    • Babadjian, L.1    Foulon, F.2    Spirkovitch, S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.