Calibration of standards for precision pitch measurement in the nanometre region by combined scanning tunnelling microscopy and X-ray interferometry

Nanotechnology

Volumn 10, Issue 4, 1999, Pages 412-417

  Lin, Wang ^a   Kuetgens, Ulrich ^b   Becker, Peter ^b   Koenders, Ludger ^b   Dacheng, Li ^a   Mang, Cao ^a  

^a TSINGHUA UNIVERSITY   (China)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; INTERFEROMETRY; NANOTECHNOLOGY; SCANNING TUNNELING MICROSCOPY; STANDARDS; X RAY ANALYSIS;

PITCH MEASUREMENT; X RAY INTERFEROMETRY;

DISTANCE MEASUREMENT;

EID: 0033354163     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/10/4/309     Document Type: Article

References (5)

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3. Bonse U and Hart M 1965 Appl. Phys. Lett. 6 155
4. Martin J, Kuetgens U, Stümpel J and Becker P 1998 Metrologia 35 811-17
5. Wiesendanger R and Günterodt H J (ed) 1992 Scanning Tunnelling Microscopy (Springer Series in Surface Sciences) vols I-III (Berlin: Springer)