pH sensitivity and hysteresis of A-WO3 gate ISFET compared with different membranes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3897, Issue , 1999, Pages 605-613

  Chiang, Jung Lung ^a   Chou, Jung Chuan ^a   Chen, Ying Chung ^a  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CURRENT VOLTAGE CHARACTERISTICS; HYDROGENATION; HYSTERESIS; MEMBRANES; PH EFFECTS; TANTALUM COMPOUNDS; TUNGSTEN COMPOUNDS;

ION SENSITIVE FIELD EFFECT TRANSISTORS (ISFET); TANTALUM OXIDE; TUNGSTEN OXIDE;

GATES (TRANSISTOR);

EID: 0033351474     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (20)