Study of within-wafer non-uniformity metrics

International Workshop on Statistical Metrology, Proceedings, IWSM

Volumn , Issue 99 TH8391, 1999, Pages 46-49

  Smith, Taber ^a   Boning, Duane ^a   Fang, Simon ^a   Shinn, Greg ^a   Stefani, Jerry ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; COMPUTER SIMULATION; ELECTRONICS INDUSTRY; REMOVAL; STATISTICAL METHODS;

STANDARD DEVIATION; WITHIN WAFER NONUNIFORMITY METRICS;

STATISTICAL PROCESS CONTROL;

EID: 0033351197     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)