Evaluation of plasma doping for sub-0.18 μm devices

Proceedings of the International Conference on Ion Implantation Technology

Volumn 2, Issue , 1999, Pages 1222-1225

  Lenoble, D ^a   Goeckner, M J ^a   Felch, S B ^a   Fang, Z ^a   Galvier, J ^a   Grouillet, A ^a  

^a ORANGE LABS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ION IMPLANTATION; PHOTORESISTS; PLASMA APPLICATIONS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON WAFERS;

PLASMA DOPING;

SEMICONDUCTOR DOPING;

EID: 0033350764     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)