Level-specific strategy of KrF microlithography for 130 nm DRAMs

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1999, Pages 809-812

  Inoue, S ^a   Asano, M ^a   Hosaka, K ^a   Sutani, T ^a   Azuma, T ^a   Kawamura, D ^a   Kobayashi, M ^a   Miyoshi, S ^a   Kanemitsu, H ^a   Tanaka, S ^a   Kotani, T ^a   Tabata, Y ^a   Tsuchida, K ^a   Kohyama, Y ^a   Kawamura, E ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DYNAMIC RANDOM ACCESS STORAGE; KRYPTON; PHOTORESISTS; TABLE LOOKUP; ULSI CIRCUITS;

LEVEL SPECIFIC CELL ARRAY PATTERNS; OPTICAL PROXIMITY EFFECT; PROCESS PROXIMITY EFFECT; RESOLUTION ENHANCEMENT TECHNOLOGIES;

LITHOGRAPHY;

EID: 0033349758     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)