Friction force of smooth surfaces of SiO2-SiO2 as a function of residual pressure

Surface Science

Volumn 433, Issue , 1999, Pages 288-292

  Deulin, E A ^a   Gatsenko, A A ^a   Loginov, B A ^b  

^a BAUMAN MOSCOW STATE TECHNICAL UNIVERSITY   (Russian Federation)

^b NATIONAL RESEARCH UNIVERSITY OF ELECTRONIC TECHNOLOGY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; FRICTION; PRESSURE EFFECTS; SCANNING TUNNELING MICROSCOPY; SILICON WAFERS; SURFACE STRUCTURE; SURFACE TENSION; TRIBOLOGY;

DYNAMIC FRICTION COEFFICIENT; RESIDUAL PRESSURE;

SILICA;

EID: 0033349288     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00152-1     Document Type: Article

References (3)

1. SMM-2000T Users Manual, KPD Co. Ltd, Moscow, 1997, 35pp.
2. E.A. Deulin, Concept of dry friction of smooth surfaces in UHV, IVC-14 Book of Abstracts, Holbrooks Printers, Portsmouth, 1998, p. 310.
3. X. Tian, B. Bhushan, The micro-meniscus effect of thin liquid film on the static friction of rough surface contact, J. Phys. D 29 (1996) 163-178.