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Volumn 2, Issue , 1999, Pages 764-766
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Comparison of shallow implantation between B, BF2 and B10H14 by molecular dynamics simulation
a a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
BORON;
BORON COMPOUNDS;
COMPUTER SIMULATION;
ION BEAMS;
MOLECULAR DYNAMICS;
SEMICONDUCTOR DOPING;
SEMICONDUCTOR JUNCTIONS;
BORON DIFLUORIDE;
ION IMPLANTATION;
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EID: 0033348464
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (2)
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References (13)
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