Investigation of scanning electron microscope overlay metrology

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 12 B, 1999, Pages 7159-7163

  Koike, Toru ^a   Ikeda, Takahiro ^a   Abe, Hideaki ^a   Komatsu, Fumio ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Charging effect; Overlay measurement; SEM; Voltage contrast

Indexed keywords

PHOTORESISTORS; PRECISION ENGINEERING; SCANNING ELECTRON MICROSCOPY; THIN FILMS;

CHARGING EFFECTS; OVERLAY METROLOGY; VOLTAGE CONTRAST;

NANOTECHNOLOGY;

EID: 0033348298     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.7159     Document Type: Article

References (2)

1. M. G. Rosenfield: Proc: SPIE 1673 (1992) 157.
2. T. Ikeda, T. Koike, H. Abe and F. Komatsu: Proc. Symp. LSI Testing, Osaka (1998) p. 140.