Effects of mask error factor on process window capability

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue pt 1, 1999, Pages 215-225

  Schurz, Dan ^a   Flack, Warren W ^a   Cohen, Simon ^a   Newman, Tom ^a   Nguyen, Khiem ^a  

^a Ultratech Stepper Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ERRORS; INSTRUMENT SCALES; PHOTOLITHOGRAPHY; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICES; SPATIAL VARIABLES CONTROL; SPATIAL VARIABLES MEASUREMENT;

CRITICAL DIMENSION; CRITICAL DIMENSION TOLERANCE BUDGET; LINEWIDTH ERROR; MASK ERROR FACTOR; NONLINEARITY EFFECT; PHOTOMASKS; PROCESS WINDOW;

MASKS;

EID: 0033347672     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373317     Document Type: Conference Paper

References (11)