Electron-stimulated desorption of a Br-chemisorbed Si(111)-7×7 surface by using a scanning tunneling microscope

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 38, Issue 12 A, 1999, Pages

  Mochiji, Kozo ^a   Ichikawa, Masakazu ^b  

^a JT RES CENTER FOR ATOM TECHNOLOGY   (Japan)

^b NATL INST FOR ADV INTERDISC RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BROMINE; CHEMISORPTION; CRYSTAL ATOMIC STRUCTURE; DESORPTION; ELECTRON EMISSION; ELECTRON IRRADIATION; HALOGEN COMPOUNDS; RADIATION EFFECTS; SCANNING TUNNELING MICROSCOPY; SURFACE STRUCTURE;

ELECTRON STIMULATED DESORPTION (ESD);

SEMICONDUCTING SILICON;

EID: 0033346908     PISSN: 00214922     EISSN: None     Source Type: None    
DOI: 10.1143/jjap.38.l1391     Document Type: Article

References (21)