Thin-layer SIMOX for future applications

IEEE International SOI Conference

Volumn , Issue , 1999, Pages 106-107

  Anc, M J ^a   Dolan, R P ^a   Jiao, J ^a   Nakai, T ^a  

^a Ibis Technology Corp   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ION IMPLANTATION; OXYGEN; SILICON WAFERS; STOICHIOMETRY; SUBSTRATES;

SEPARATION BY IMPLANTATION OF OXYGEN (SIMOX);

SILICON ON INSULATOR TECHNOLOGY;

EID: 0033346694     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)