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Volumn , Issue , 1999, Pages 431-434
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Influence of boron ion implantation on the mechanics and electret properties of Si3N4 single layer film
a
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS FILMS;
BORON;
CHEMICAL VAPOR DEPOSITION;
ELECTRETS;
ELECTRIC CORONA;
ELECTRIC CURRENT MEASUREMENT;
ION IMPLANTATION;
MICROMACHINING;
POSITIVE IONS;
PRESSURE EFFECTS;
SPECTRUM ANALYSIS;
THERMAL EFFECTS;
CHARGE DECAY;
ELECTRET VIBRATING MEMBRANE;
ISOTHERMAL SURFACE POTENTIAL DECAY MEASUREMENTS;
LOW PRESSURE CHEMICAL VAPOR DEPOSITION;
MECHANISTIC PROPERTY;
NEGATIVE CORONA CHARGING;
THERMALLY STIMULATED DISCHARGE CURRENT SPECTRUM ANALYSIS;
SILICON NITRIDE;
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EID: 0033346058
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Article |
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Times cited : (2)
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References (5)
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