Voltage scaling of ferroelectric thin films deposited by CVD

Integrated Ferroelectrics

Volumn 26, Issue 1, 1999, Pages 119-135

  Bilodeau, Steven M ^a   Johnston, Stephen T ^a   Russell, Michael W ^a   Vestyck, Daniel J ^a   Van Buskirk, Peter C ^a  

^a ENTEGRIS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC FIELDS; ELECTRIC POTENTIAL; ELECTRIC PROPERTIES; FATIGUE OF MATERIALS; LEAKAGE CURRENTS; SEMICONDUCTING LEAD COMPOUNDS;

FERROELECTRIC MEMORY; HYSTERESIS LOOPS;

THIN FILMS;

EID: 0033345909     PISSN: 10584587     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1080/10584589908215617     Document Type: Article

References (6)

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4. th US-Japan Symposium on Dielectric and Piezoelectric Ceramics, October 15-18, 1997, Plymouth Massachusetts, USA.
5. H. Miki et al., Jpn. J. Appl. Phys., 33, (1994) 5143.
6. X. Chen, A. Kingon, K. Bellur and O. Auciello, Integrated Ferroelectrics, 5, (1994) 59.