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Volumn 3822, Issue , 1999, Pages 46-53
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Laser-induced formation of semiconductor films based on transition-metal silicides
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
ENERGY GAP;
IRON COMPOUNDS;
NEODYMIUM LASERS;
SEMICONDUCTING FILMS;
SILICON CARBIDE;
SUBSTRATES;
LASER CHEMICAL VAPOR DEPOSITION (LCVD);
LASER APPLICATIONS;
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EID: 0033345081
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (8)
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References (6)
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