Spatially resolved measurements of plasma parameters in a broad-beam ion source

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 1089-1092

  Flamm, Dieter ^a   Zeuner, Michael ^b  

^a Inst Oberflachenmodifizierung L   (Germany)

^b Permoserstrasse 15 D 04318   (Germany)

Author keywords

Ion source; Langmuir probe; Plasma parameters; Surface modification

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; MAGNETIC FIELDS; PLASMA SHEATHS; SURFACE TREATMENT;

LANGMUIR PROBES;

ION SOURCES;

EID: 0033344798     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00123-1     Document Type: Article

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