Deep reactive ion etching of silicon

Materials Research Society Symposium - Proceedings

Volumn 546, Issue , 1999, Pages 51-61

  Ayon A A ^a   Chen, K S ^b   Lohner, K A ^a   Spearing, S M ^a   Sawin, H ^a   Schmidt, M A ^b  

^a USA   (United States)

^b Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; INTERFEROMETRY; MICROELECTROMECHANICAL DEVICES; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; TURBOMACHINERY;

DEEP REACTIVE ION ETCHING (DRIE);

SILICON;

EID: 0033344517     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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