New method for making shallow p-type junctions

Proceedings of the International Conference on Ion Implantation Technology

Volumn 2, Issue , 1999, Pages 1175-1178

  Ling, Peiching ^a   Strathman, Michael D ^a   Ling, Chih Hsiang ^a   Barney, Doyle ^a   Walsh, David ^a   Larson, Larry ^a   Bennett, Joe ^a   Felch, Susan ^a  

^a Institute for Social   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON COMPOUNDS; FLUORINE; ION IMPLANTATION; ION SOURCES; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON;

MOLECULAR ION IMPLANTATION;

SEMICONDUCTOR JUNCTIONS;

EID: 0033344139     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)