Techniques to detect and analyze photomask CD uniformity errors

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue pt 1, 1999, Pages 209-214

  Vacca, Anthony ^a   Ng, Waiman ^a   Anderson, Geoffrey ^a   Rockwell, Barry ^a   Dong, Aihua ^a   Taylor, Darren ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; CALIBRATION; DEFECTS; ERRORS; INSPECTION; INSTRUMENT SCALES; PHOTOSENSITIVITY; QUALITY CONTROL; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET INSTRUMENTS;

CRITICAL DIMENSION; INSPECTION SYSTEM; MASK ERROR ENHANCEMENT; PHOTOMASK; ULTRAVIOLET PATTERN INSPECTION TOOLS;

MASKS;

EID: 0033342958     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373316     Document Type: Conference Paper

References (4)