Pulse-time-modulated plasma etching for high performance polysilicon patterning on thin gate oxides

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1999, Pages 37-40

  Ohtake, Hiroto ^a   Samukawa, Seiji ^a   Noguchi, Ko ^a   Iida, Hidekazu ^a   Sato, Arthur ^a   Qian, Xue yu ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRODES; GATES (TRANSISTOR); INTEGRATED CIRCUIT MANUFACTURE; OXIDES; SEMICONDUCTING SILICON;

INDUCTIVELY COUPLED PLASMA; PLASMA CHARGING; POLYSILICON PATTERNING; THIN GATE OXIDES;

PLASMA ETCHING;

EID: 0033341914     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (3)